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	1	Atomic layer deposition of Al²O³ on NF³-pre-treated graphene Junige, Marcel. - Dresden : Technische Universität Dresden, 2019
	2	Current Modulation of a Heterojunction Structure by an Ultra-Thin Graphene Base Electrode Alvarado Chavarin, Carlos. - Basel : MDPI, 2018
	3	Temporal Variability of CO2 and N2O Flux Spatial Patterns at a Mowed and a Grazed Grassland In: Ecosystems 10.4.2017: 1-13
	4	Growth of the Initial Atomic Layers of Ta‐N Films During Atomic Layer Deposition on Silicon‐Based Substrates Enthalten in Chemical vapor deposition Bd. 17, 2011, Nr. 1‐3: 37-44. 8 S.
	5	Inline deposition of microcrystalline silicon solar cells using a linear plasma source Enthalten in Physica status solidi / C / Current topics in solid state physics Bd. 7, 2010, Nr. 3‐4: 1097-1100. 4 S.
	6	Atomlagenabscheidung als Werkzeug für die Nanotechnologie Enthalten in Vakuum in Forschung und Praxis Bd. 20, 2008, Nr. 1: 7-10. 4 S.
	7	1st Conference Clinical Trials on Alzheimer’s Disease September 17-18-19, 2008 School of Medecine Montpellier, France Enthalten in The journal of nutrition, health & aging Bd. 12, Nr. 8, date:10.2008: 531-543
	8	A novel copper damascene technique for power loaded SAW structures Enthalten in Materials Research Society: MRS online proceedings library Bd. 833, 1.2.2005, Nr. 1, date:12.2004: 95-100
	9	Feasibility Study for Usage of Diluted Fluorine for Chamber Clean Etch Applications as an Environmental Friendly Replacement of NF3 Enthalten in Materials Research Society: MRS online proceedings library Bd. 914, 15.6.2006, Nr. 1, date:12.2005: 1-6
	10	In situ XPS investigation about the growth of the first atomic layer of Ta(N) films deposited by thermal TBTDET ALD Enthalten in Materials Research Society: MRS online proceedings library Bd. 1146, 1.2.2011, Nr. 1, date:12.2008: 90801-90806

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